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INTERSTITIAL DIFFUSION OF ARSENIC IN SILICON
Pages : [43] - [60]
Received : March 30, 2016; Revised November 4, 2016
Communicated by : Professor Ana Rosa Silva
Abstract
The mechanism underlying the long-range interstitial migration of nonequilibrium impurity interstitial species was used to simulate arsenic redistribution in ion implantation. An excellent agreement of the calculated arsenic concentration profiles with experimental data allows one to assume that the migration of nonequilibrium arsenic interstitial atoms makes a significant contribution to the formation of a low concentration region on thermal arsenic diffusion. The arsenic concentration profile calculated for a temperature of 1050°C within the framework of this assumption agrees well with the experimental one. A number of parameters describing arsenic diffusion at 1050°C and 1108°C have been obtained.
Keywords
arsenic, silicon, interstitial diffusion, modelling.